Extreme high mobility cmos logic

ABSTRACT

A CMOS device includes a PMOS transistor with a first quantum well structure and an NMOS device with a second quantum well structure. The PMOS and NMOS transistors are formed on a substrate.

This is a Continuation of application Ser. No. 14/977,479 filed Dec. 21,2015 which is a Continuation of Ser. No. 14/302,371 filed Jun. 11, 2014now U.S. Pat. No. 9,548,363 issued Jan. 17, 2017 which is Continuationof application Ser. No. 13/962,890 filed Aug. 8, 2013 now U.S. Pat. No.8,802,517 issued Aug. 12, 2014 which is Continuation of application Ser.No. 13/450,359 filed Apr. 18, 2012 now U.S. Pat. No. 8,518,768, issuedAug. 27, 2013 which is a Divisional of application Ser. No. 11/305,452filed Dec. 15, 2005 now U.S. Pat. No. 8,183,556, issued May 22, 2012.

TECHNICAL FIELD

This invention relates to semiconductor processing, and moreparticularly to the manufacture of extreme high mobility CMOS logic.

BACKGROUND

Complementary Metal Oxide Semiconductor (CMOS) transistor structures areessential in many modern electronic devices. CMOS chips includemicroprocessor, microcontroller, static RAM, and other digital logiccircuits. A primary advantage of CMOS logic is that it only usessignificant power when its transistors are switched between the on andoff states. As a result, CMOS devices use little power and producelittle heat.

CMOS structures are “complementary” in that a single CMOS devicerequires one PMOS transistor and one NMOS transistor, only one of whichis switched on at a time. Traditionally, the PMOS transistor and theNMOS transistor in a CMOS device are both made of the same material, butare doped differently to provide the desired characteristics. High holemobility is desirable for PMOS devices, and high electron mobility isdesirable for NMOS devices. When the same material is used for both theNMOS and PMOS devices, often a tradeoff is made between high holemobility and high electron mobility. For example, silicon, the mostprevalently used semiconductor material, has a high electron mobility of1400 cm²/Vs, but only a moderate hole mobility of 450 cm²/Vs.

BRIEF DESCRIPTION OF THE DRAWINGS

Features and advantages of the present invention will be apparent uponreading the following detailed description in conjunction with theaccompanying drawings and appended claims provided below, where:

FIG. 1A illustrates an embodiment of a cross sectional view of a CMOSdevice;

FIGS. 1B through 1B-6 illustrate cross sectional views of differentembodiments of a CMOS device; and

FIGS. 2A through 2Z illustrate cross sectional views of a CMOS device inintermediate stages of manufacture in accordance with one embodiment ofthe invention.

DETAILED DESCRIPTION

Described herein are methods of fabricating CMOS devices. In thefollowing description numerous specific details are set forth. One ofordinary skill in the art, however, will appreciate that these specificdetails are not necessary to practice embodiments of the invention.While certain exemplary embodiments of the invention are described andshown in the accompanying drawings, it is to be understood that suchembodiments are merely illustrative and not restrictive of the currentinvention. This invention is not restricted to the specificconstructions and arrangements shown and described, becausemodifications may occur to those ordinarily skilled in the art. In otherinstances, well known semiconductor fabrication processes, techniques,materials, equipment, etc., have not been set forth in particular detailin order to not unnecessarily obscure embodiments of the presentinvention.

The following description details a CMOS device and a method ofmanufacturing a CMOS device with NMOS and PMOS transistors that may beformed of different material compositions and coexist on a monolithicsubstrate. By choosing materials with high hole mobility for the PMOStransistors, and materials with high electron mobility for the NMOStransistors, CMOS devices can be manufactured that can turn on at lowervoltages, can generate less heat, can consume less power, and can haveincreased processing ability.

FIG. 1A illustrates a cross section of a CMOS device 100 according toone embodiment of the present invention. As illustrated, the CMOS device100 includes a PMOS transistor 105 and an NMOS transistor 107 formed ona substrate 112. In one embodiment, the substrate 112 is a highlyresistive substrate. In one embodiment, the substrate 112 is asemi-insulating substrate. Semi-insulating substrates have ahigh-resistivity and can be valuable in reducing parasitic capacitancesand cross-communication between transistors in high speed or highfrequency applications.

Examples of semi-insulating substrates include silicon on insulator(SOI), silicon carbide (SiC), and doped silicon. Other examples ofsemi-insulating materials include III-V materials (materials in whichone element is chosen from column III of the periodic table and oneelement is chosen from column V of the periodic table) such as galliumarsenide (GaAs) or indium phosphide (InP). In regards to doped silicon,heavy metal dopants can be added that bond with electron and/or holetraps to reduce free charge, and hence conductivity. Examples ofpossible dopants include chromium, gold, iron, and vanadium. In oneembodiment, a p-type doped substrate is used. P-type dopants include,for example, Boron and Aluminum. Doped silicon substrates can comepre-doped, or a doping process can be implemented during devicefabrication.

In one embodiment, the substrate 112 is a wafer. The wafer can be of asize sufficient for use in standard integrated circuit fabricationequipment. For example, in one embodiment the wafer is 300 mm indiameter.

In one embodiment, shallow trench isolation (STI) structures 113 areformed in the substrate 112. STI structures 113 can comprise oxides orother dielectric materials, and are used to define active areas and toseparate device elements, such as transistors. In the illustratedembodiment of FIG. 1A, a shallow trench isolation structure 113separates the PMOS transistor 105 from the NMOS transistor 107. In oneembodiment, the shallow trench isolation structure 113 has a depth ofabout 80 nm to about 100 nm. In one embodiment, the shallow trenchisolation structure 113 has a width of about 100 nm to about 200 nm. Inalternative embodiments, no shallow trench isolation structures areformed. In one embodiment, deep trench isolation structures are formed.

A first buffer layer 115 separates the PMOS transistor 105 from thesubstrate 112. In certain embodiments, the first buffer layer 115 actsas a virtual substrate, permitting the PMOS transistor 105 to be builton an otherwise incompatible substrate 112. The first buffer layer 115can be formed from silicon germanium (SiGe), indium aluminum antimonide(InAlSb), or other materials. In one embodiment, the first buffer layer115 comprises materials with a larger lattice constant than thesubstrate 112. In one embodiment, the first buffer layer 115 is thickenough to trap defects (otherwise known as dislocations).

Defects often occur at locations of lattice mismatch and can causecurrent leakage when located near a channel. Therefore, by restrictinglattice mismatches to the buffer layer, defects in the subsequentbarrier layer can be prevented. Where a buffer layer is thick enough,defects can be distanced from the surface of the buffer layer, and arethus less likely to interact with subsequent layers. In one embodiment,the first buffer layer has a thickness of about 1-5 microns. In oneembodiment, the first buffer layer is approximately 3 microns.

In certain embodiments, the first buffer layer 115 is a graded bufferlayer (layer that includes two or more materials, the materials having adifferent ratio at top and the bottom ends). By grading the bufferlayer, the amount of defects within the layer is reduced. Furthermore,lattice mismatches that are too large can generate defects thatsubsequently form threading dislocations. These threading dislocationscan penetrate the entire layer and terminate at the surface, causingcurrent leakage. Grading of the buffer layer can eliminate suchthreading dislocations.

In one embodiment, the first buffer layer 115 comprises a graded bufferlayer that is step graded. A step graded layer includes a series ofdistinct steps, each step having a slightly different chemicalcomposition. In one example, a step graded SiGe layer has three steps. Afirst step comprises 10% Ge and 90% Si, a second step comprises 20% Geand 80% Si, and a third step comprises 30% Ge and 70% Si. To determinethe number of steps necessary, one can set the beginning and endingcompositions, and the degree of change in the composition between steps.The smaller the degree of change in chemical composition between steps,the greater the number of steps needed.

In one embodiment, the first buffer layer 115 comprises a graded bufferlayer that is linearly graded. In a linearly graded layer, the chemicalcomposition varies continuously, and every horizontal slice of the layercan yield a different composition. The degree of similarity betweenproximate slices depends upon the thickness of the layer and the degreeof change in chemical composition between the top and bottom ends of thelayer.

To minimize lattice mismatch, the first buffer layer 115 can be gradedgradually (with a low rate of change). In one embodiment, the rate ofchange is between 5% and 30% per micrometer. For example, in oneparticular embodiment, when a SiGe buffer layer is used on a p-typedoped silicon substrate, the SiGe buffer layer can have 100% Si and 0%Ge where it contacts the substrate. The SiGe buffer layer can be gradedgradually, such that it has about 20% to 50% Si and 80% to 50% Ge whereit contacts a first bottom barrier layer 119. In one embodiment, thefirst bottom barrier layer 119 is composed of a constant Geconcentration ranging from 70% to 30%. In one embodiment, the firstbuffer layer 115 comprises a SiGe buffer layer that is graded graduallyfrom 100% Si to 30% Si. Use of a graded buffer layer can reduce defectdensities from the order of 10¹²/cm² to the order of 10⁵/cm².

In certain embodiments, the first buffer layer 115 is a semi-insulatingbuffer layer or a highly resistive buffer layer. When the first bufferlayer 115 is a semi-insulating buffer layer or a highly resistive bufferlayer it can reduce parasitic capacitances and ameliorate or eliminatecross-communication between transistors. In one embodiment, the firstbuffer layer 115 is a semi-insulating buffer layer or a highly resistivebuffer layer and the substrate 112 is comprised of high-resistivitysilicon (Si).

Referring to FIG. 1A, a first bottom barrier layer 119 is situated overthe first buffer layer 115. A first quantum well layer 121 is situatedover the first bottom barrier layer 119, and a first top barrier layer122 is situated over the first quantum well layer 121. The first bottombarrier layer 119, first quantum well layer 121, and first top barrierlayer 122 form a PMOS quantum well structure that defines a firstchannel.

A quantum well (QW) structure is a specialized form of a heterojunction(an abrupt change in atom composition across a plane). The centralfeature in a heterojunction is a difference in the band gap of at leastone of the valence or conduction bands. In the quantum well structure,the first bottom barrier layer 119 and first top barrier layer 122 canprovide defect free QWs and localized carriers in the first quantum welllayer 121 due to the band gap differences. The localized charge can onlyexist in the quantum well layer 121 at certain discreet quanta ofenergy, hence the name “quantum well.”

In one embodiment, the first bottom barrier layer 119 has the samecomposition of Si and Ge that the graded buffer layer has where the twolayers intersect. In an alternative embodiment, the first bottom barrierlayer 119 has a greater concentration of Si than the graded buffer layerhas where the two layers intersect. A larger concentration of Si in thefirst bottom barrier layer 119 causes it to have a larger latticeconstant than the graded buffer layer, and the lattice mismatch cangenerate strain to the first bottom barrier layer 119. This strain canprovide a large band offset between the first quantum well layer 121 andthe first bottom barrier layer 119. In one embodiment, the first bottombarrier layer 119 comprises between about 40% Si to about 100% Si.

In one embodiment, the first bottom barrier layer 119 is lattice matchedto the first buffer layer 115. This can facilitate the first barrierlayer 119 remaining defect free. In example, if the first buffer layer115 is a graded SiGe buffer layer, the first bottom barrier layer 119can be SiGe and have the same ratio of silicon to germanium as the firstbuffer layer 115 where they intersect.

In certain embodiments, the first bottom barrier layer 119 should bethick enough to prevent it from becoming strained. Strain is preventedbecause; as a layer's thickness increases, the amount of strain in thelayer decreases for a given lattice mismatch. Thus, beyond a certaincritical thickness a layer will be relaxed. This critical thickness isthe thickness at which the same amount of energy is required to maintaina strain as to revert back to an unstrained state. As the percentage ofGe increases starting from OTOGe, the critical layer thicknessdecreases. The layer will remain relaxed above the critical layerthickness. With thick enough barrier layers, the first barrier layerscan strain the first quantum well layer 121 without themselves becomingstrained. The strain in the first quantum well layer 121 helps toincrease the p-hole mobility. In one embodiment, the interfaces betweenthe first QW layer 121 and the barrier layers 119 and 122 are free ofdefects (dislocations).

In exemplary embodiments, the first barrier layers 119 and 122 are alsothick enough to prevent or ameliorate tunneling. Tunneling occurs when aparticle passes through a barrier without the normally required energy,and can be a major source of current leakage in transistors. Tunnelingcan be prevented by increasing the amount of energy necessary to passthrough the barrier, which is achieved by increasing barrier thickness.Thus at effective thickness levels, particles can be confined to thequantum well layer 121. In one embodiment, the first top barrier layer122 and first bottom barrier layer 119 have thicknesses betweenapproximately 100 and 500 angstroms. In one embodiment, the first topbarrier layer 122 and first bottom barrier layer 119 have equalthicknesses. In another embodiment, the first top barrier layer 122 andfirst bottom barrier layer 119 have different thicknesses andSi_(x)Ge_(1-x) compositions. For example, the first top barrier layer122 might have the composition Si_(0.4)Ge_(0.6) and the first bottombarrier layer 119 might have the composition Si_(0.3)Ge_(0.7). In oneembodiment, the first top barrier layer 122 comprises 100% Si.

The barrier layers can strain the first quantum well layer 121, therebyimproving its free charge carrier mobility. In one embodiment, the firsttop barrier layer 122 has substantially the same composition as thefirst bottom barrier layer 119. In an alternative embodiment, the firsttop barrier layer 122 and first bottom barrier layer 119 have differentcompositions. The first barrier layers, 119 and 122, place the firstquantum well layer 121 under pressure from its top and bottom tomaintain a particular lattice structure. Thus, the quantum well layer121 can be more likely to maintain its strain.

The first quantum well layer 121 acts as the channel to the PMOStransistor 105, and can be formed of materials having a low bandgap anda high hole mobility. Examples of materials having these propertiesinclude germanium (Ge), gallium antimonide (GaSb), indium arsenide(InAs) and indium antimonide (InSb), which have hole mobilities of 1900,1000, 500 and 850 cm²/Vs, respectively. The surrounding barrier layers,in contrast, are formed from materials having a high band gap and alattice structure similar to the lattice structure of the first quantumwell 121, such as SiGe, AlSb and GaAlSb This difference in band gapsgenerates the quantum “well,” in which charge of discrete energy levelscan be produced in the QW layer. Charge carriers can be supplied to theQW layer by doping the barrier layer, for example by adding a deltadoped layer. The doping of the barrier layer may be performed by in situdoping of the dopants or by ion implant of the dopants. In oneembodiment, the first top barrier layer 122 is divided into a firstspacer layer, a first delta doped layer, and a first barrier layer. Thefirst delta doped layer can be a P-type delta doped layer and cancomprise, for example, carbon, barilium, or other p-type dopants. A highhole mobility is desirable for PMOS transistors, for example, toincrease operating speed and reduce power consumption.

In the illustrated embodiment of FIG. 1A, the first quantum well layer121 is a buried channel. A buried channel has no direct interface to agate oxide. Rather, an intermediary layer separates the channel from thegate oxide. As shown, the first top barrier layer 122 acts as theintermediary layer. Implementing a buried channel approach may increasemobility of electric charge, and reduces current leakage by reducingelectron and hole scattering from surfaces and from impurities. Inalternative embodiments, a surface channel approach may be implemented,in which the channel directly interfaces the gate oxide.

Straining the first quantum well layer 121 may improve hole mobilityeven further. In one embodiment, where a 100% Ge QW layer is used, theincrease in mobility in the strained Ge QW is more than 4-6× comparedwith bulk (unstrained) Ge p-hole mobility. The larger the latticemismatch between the QW layer and the barrier layers, the larger thestrain and the higher the bandgap difference between them., This canincrease mobility and decrease power consumption, among otheradvantages. A strained lattice formation is maintained by having thefirst quantum well layer 121 be sufficiently thin to match the latticestructure of the barrier layers. Strain is achieved because, it takes afirst amount of energy for molecules of a layer to resist bonding withthe molecules of adjacent layers, and a second amount of energy for themolecules of the layer to deviate from their natural lattice structure.Below a certain thickness, it requires less energy to change in latticestructure than to resist bonding.

To enable the quantum features of the first quantum well layer 121, thefirst quantum well layer 121 should be sufficiently thin to confineparticles in one dimension, forcing those particles to occupy a planarregion. To enable this feature, the quantum well thickness should becomparable to the de Broglie wavelength of the charge carriers(electrons and holes). In one embodiment, the first quantum well layer121 has a thickness between about 50 and 300 angstroms.

In an exemplary embodiment, the first quantum well layer 121 has alattice structure similar to, but not the same as, the lattice structureof the first barrier layers. Therefore, the first quantum well layer 121and first barrier layers are slightly lattice mismatched. The greaterthe dissimilarity in lattice structures, the greater the strain on thefirst quantum well layer 121. However, if the lattice structure of thefirst quantum well layer 121 is too different from the lattice structureof the barrier layers, the energy required to maintain the strain is toohigh, and the quantum well layer will eventually revert to itsunstrained lattice constant.

In one exemplary example, the barrier layers can be SiGe with between 5%and 30% Si, and the first quantum well layer can be Ge. A Ge layersandwiched between two SiGe layers would be compressively strained,since Ge has a lattice constant that is 4.2% larger than Si. In oneembodiment, there is a lattice mismatch of between 0.5% and 1.65%between the first barrier layers and the first quantum well layer 121.

In alternative embodiments, in which the quantum well layer 121 is notstrained, it has a lattice structure that is the same as the latticestructure of one or both of the barrier layers. It can be advantageousto have matching lattice structures, whether through straining orbecause the natural lattice structures match, to ameliorate thepossibility of defects between layers.

Referring back to FIG. 1A, a second buffer layer 117 separates the NMOStransistor 107 from the substrate 112. In one embodiment, the secondbuffer layer 117 comprises a polar material (materials having bothcovalent and ionic bonds). When the second buffer layer 117 comprises apolar material, a nucleation layer 116 can be formed between it and thesubstrate 112 to improve bonding. Since Si is a non-polar material(forms only covalent bonds), a nucleation layer 116 can reduceanti-phase domains (bonds of As—As or Ga—Ga that can increase deviceleakage). A reduction in anti-phase domains can eliminate carriertrapping and greatly increase bonding. In one embodiment, the nucleationlayer 116 can comprise any III-V material (a material that comprises oneelement from column III of the periodic table and one element fromcolumn V of the periodic table) that has a larger lattice constant thanSi, but a smaller lattice constant than the second buffer layer 117. Forexample, the nucleation layer 116 may comprise GaAs, AlSb, or otherappropriate III-V materials. In further embodiments the nucleation layeris a semi-insulating layer or a highly resistive layer.

In one embodiment, the second buffer layer 117 is a graded buffer layer.In one particular embodiment, the second buffer layer 117 is a linearlygraded InAlSb buffer layer that comprises 0% In where it intersects thenucleation layer 116. The percentage of In is gradually increased toapproximately 85% In where the second buffer layer 117 contacts a secondbottom barrier layer 125. In another embodiment, the second buffer layer117 is a step-graded InAlSb buffer layer having an In_(x)Al_(1-x)Sbcomposition wherein x varies for each step by a set amount.

The second buffer layer 117 can serve the same function for the NMOStransistor 107 that the first buffer layer 115 serves for the PMOStransistor 105. As with the first buffer layer 115, in variousembodiments the second buffer layer 117 can act as a virtual substrate,can trap defects, and can be semi-insulating or highly resistive. In oneembodiment, the second buffer layer 117 and nucleation layer have acombined thickness of about 1-5 microns.

Referring back to FIG. 1A, a second bottom barrier layer 125 is situatedover the second buffer layer 117. A second quantum well layer 127 issituated over the second bottom barrier layer 125 and a second topbarrier layer 129 is situated above the second quantum well layer 127.The second bottom barrier layer 125, second quantum well layer 127, andsecond top barrier layer 129 forms an NMOS quantum well structure thatdefines a second channel.

In various embodiments the NMOS quantum well structure has substantiallythe same structural properties as discussed with reference to the PMOSquantum well structure. For example, in one embodiment the second bottombarrier layer 125 is lattice matched to the second buffer layer 117, andthe second top barrier layer 129 has substantially the same compositionas the second bottom barrier layer 125. In another embodiment, thesecond barrier layers should be thick enough to prevent them frombecoming strained and to prevent tunneling, and the second quantum welllayer 127 should be thin enough to maintain strain and to confineparticles to a single planar region. In other embodiments the secondquantum well layer 127 can be a buried channel or a surface channel.

The second quantum well layer 127 acts as the channel to the NMOStransistor 107, and can be formed of materials having a low bandgap andhigh electron mobility. High electron mobility is desirable, forexample, to increase operating speed and reduce power consumption.Examples of materials having these properties include indium antimonide(InSb) and indium arsenide (InAs), which have electron mobilities of77,000 cm²/Vs and 40,000 cm²/Vs, respectively. Other possible materialsinclude combinations of at least two elements, at least one of theelements chosen from column III of the periodic table and at least oneof the materials chosen from column V of the periodic table. Forexample, indium gallium antimonide (InGaSb) could be used to form thesecond quantum well layer 127. The surrounding barrier layers, incontrast, are formed from materials having a high band gap and a latticestructure similar to the lattice structure of the second quantum well127, such as InAlSb, AlGaInSb, or AlSb. In one embodiment, in which thesecond QW layer 127 comprises InAs, the second barrier layers, 125 and129, comprise InP or InAlAs.

As discussed with regard to the PMOS quantum well structure, in oneembodiment the NMOS quantum well structure has a second quantum welllayer 127 that is similar to, but not the same as, the lattice structureof the second barrier layers. In one embodiment, there is a latticemismatch of between 0.5% and 2.0% between the second barrier layers 125and 129 and the second quantum well layer 127. In alternativeembodiments, the second quantum well layer 127 has the same latticestructure as the second barrier layers 125 and 129.

In one embodiment, the second buffer layer 117, second bottom barrierlayer 125, and second top barrier layer 129 are relaxed InAlSb layers,and the second quantum well layer 127 is a compressively strained InSblayer. In an alternative embodiment, the second buffer layer 117, secondbottom barrier layer 125, and second top barrier layer 129 are relaxedindium aluminum arsenide (InAlAs) layers, and the second quantum welllayer 127 is an InAs layer. In further embodiments, the second quantumwell layer 127 is an indium antimony arsenide (InSbAs) layer.

In the illustrated embodiment of FIG. 1A, a first high-k gate dielectriclayer 130 is situated above the first top barrier layer 122. Use ofhigh-k materials for gate dielectrics can provide substantialadvantages, such as reducing gate leakage. Examples of materials thatcan be used to form the first high-k gate dielectric layer 130 includehigh-k dielectric materials such as aluminum dioxide (Al₂O₃), zirconiumdioxide (ZrO₂), tantalum oxide (Ta₂O₅), aluminum nitride (AlN), silicondioxide (SiO₂), gallium gadolinium oxide (GaGdO₃) and hafnium dioxide(HfO₂). Some materials such as ZrO₂ may have superior functionality inthe PMOS transistor 105. In one embodiment, the first high-k gatedielectric layer 130 has a thickness of approximately 15-75 Angstroms.

A first metal gate electrode 133 is situated over the first high-k gatedielectric layer 130. Metal gate electrodes may be more effective thanpolysilicon electrodes when combined with high-k gate dielectricmaterials. Metal gate electrodes avoid Fermi level pinning at the metalelectrode/high-k interface, which can cause high threshold voltages.Metal gate electrodes can also be effective in screening phonons fromcoupling to the channel under inversion conditions, resulting inimproved channel mobility. In one embodiment, the first metal gateelectrode 133 is a metal having a mid-gap work function of betweenaround 4.4 to around 4.8 eV, such as titanium nitride (TiN). Inalternative embodiments, the first metal gate electrode 133 is a p-typemetal and has a work function of around 4.8 eV to around 5.6 eV.Examples of p-type metals include Ti, Ru, Rb₂O, Al, Ni, Co, Pt and Mo.Silicides and nitrides of these metals can also make effective metalgate electrodes. In one embodiment, the first metal gate electrode isabout 500-1000 A thick. In one embodiment, gate length is about 20nm-0.25 microns. In one embodiment, the source to gate and the gate todrain distances are about 50-100 A.

In the illustrated embodiment shown in FIG. 1A, the first high-k gatedielectric layer 130 and first metal gate electrode 133 form a firstrecessed gate structure 148. In a recessed gate, portions of the topbarrier layer are etched to allow the gate to be closer to the channel(quantum well layer). This causes the source and drain regions of thetransistor to be raised such that they partially enclose the gate.Recessed gates can provide better gate control, reduce the necessaryoperating voltage, and dramatically reduce any parasitic resistance ofthe transistor. Combining a recessed gate with a high-k gate dielectriccan provide superior gate control, can allow for enhancement modeoperation, and can reduce external resistance by providing a raisedsource drain geometry. In one embodiment, the first top barrier layer122 is etched such that there is a distance of about 10-30 nm betweenthe quantum well layer and the first high-k gate dielectric layer 130.

In alternative embodiments, the first high-k gate dielectric layer 130and first metal gate electrode 133 form a non-recessed gate. This canreduce the number of processing steps and increase device simplicity.

Referring back to FIG. 1A, a second high-k gate dielectric layer 135 issituated above the second top barrier layer 129. In one embodiment, thesecond high-k gate dielectric layer 135 is formed of substantially thesame materials as the first high-k dielectric layer 130. In alternativeembodiments, the second high-k dielectric layer 135 is formed ofdifferent materials. For example, some materials such as Al₂O₃ mayexhibit superior functionality in the NMOS transistor 107. In oneembodiment, the second high-k gate dielectric layer 135 has a thicknessof approximately 15-75 Angstroms. In one embodiment, the second high-kgate dielectric layer 135 comprises one of HfO₂, ZrO₂, TiO₂, Al₂O₃,GaGdO₃, AlN, BN, SiO₂, or another similar dielectric material.

A second metal gate electrode 137 is situated over the second high-kgate dielectric layer 135. In one embodiment, the second metal gateelectrode 137 is a metal having a mid-gap work function of betweenaround 4.4 to around 4.8 eV, such as TiN. In alternative embodiments,the second metal gate electrode 137 is an n-type metal and has a workfunction of around 3.9 eV to around 4.4 eV. N-type metals include, forexample, Ti, Al and TiAl.

In the illustrated embodiment, the second high-k gate dielectric layer135 and second metal gate electrode 137 form a second recessed gatestructure 149. In one embodiment, the second recessed gate structure 149has a depth of about 10-30 nm. In alternative embodiments, the secondhigh-k gate dielectric layer 135 and second metal gate electrode 137form a non-recessed gate.

As shown in FIG. 1A, isolation layer 110 separates the PMOS transistor105 and the NMOS transistor 107. In the illustrated embodiment, theisolation layer extends to the substrate 112, and contacts the STIstructure 113. The isolation layer 110 is comprised of materials havinga high resistivity. In one embodiment, the isolation layer 110 comprisessilicon dioxide (SiO₂) or silicon nitride (Si₃N₄). In one embodiment,the isolation layer 110 comprises the same material as the STIstructures 113. In an alternative embodiment, the isolation layer 110and STI structures 113 comprise different materials.

A PMOS drain metal contact 140 is situated above the drain region 150 ofthe PMOS transistor 105, and an NMOS drain metal contact 141 is situatedabove the drain region 151 of the NMOS transistor 107. A PMOS sourcemetal contact 142 and NMOS source metal contact 143 are situated abovethe source region 152 of the PMOS transistor 105 and the source region153 of the NMOS transistor 107, respectively. In one embodiment, all themetal contacts are comprised of the highly conductive metal. Highlyconductive metals can facilitate device operation in a high frequencyenvironment. In another embodiment, a Si contact metal such as Al isused for the PMOS contacts, and a III-V contact metal such as Ti or Ptis used for the NMOS contacts.

In one embodiment, a substrate 112, buffer layers 115 and 117,nucleation layer 116, recessed gate structures 148 and 149, buriedchannels, high-k gate dielectrics, metal gate electrodes 133 and 137 andquantum well structures are combined for both the PMOS transistor 105and NMOS transistor 107 to form a CMOS device that can have a maximizedfree charge mobility and minimal leakage. In another embodiment, thesefeatures are combined to form an AlSb, GaAs or III-V binary materialnucleation layer, an In_(x)Al_(1-x)Sb buffer layer, In_(x)Al_(1-x)Sbbarrier layers with the same or different In compositions, an InSbquantum well layer for the NMOS transistor. For the PMOS transistor, thefeatures are combined to form a graded SiGe buffer layer, relaxed SiGebarrier layers and a strained Ge quantum well layer for the PMOStransistor. The PMOS transistor 105 and NMOS transistor 107 of thisembodiment may have further improvement in free charge mobility.

FIG. 1B illustrates a cross section 154 of the CMOS device of FIG. 1A.In accordance with multiple embodiments of the present invention, FIGS.1B-1 through 1B-3 illustrate variant compositions of the first topbarrier layer 122 and FIGS. 1B-4 through 1B-6 illustrate variantcompositions of the second top barrier layer 129.

In the illustrated embodiment of FIG. 1B-1, the first top barrier layer122 comprises a first spacer layer 156, a first delta doped layer 158, afirst barrier layer 123, a first etch stop layer 161, and a first caplayer 163. The first spacer layer 156 is placed to separate the firstdelta doped layer 158 from the first quantum well layer 121. In oneembodiment, the first spacer layer 156 has substantially the samecomposition as the first bottom barrier layer 119. In one embodiment thefirst spacer layer 156 has a thickness of about 20-100 angstroms.

The first delta doped layer 158 is a thin doped layer that residesbetween thicker un-doped layers. The first delta doped layer 158provides an abundance of free charge carriers to the first quantum welllayer 121. Since the first delta doped layer 158 is formed in the PMOStransistor 105, the first delta doped layer 158 is doped with a P-typedopant such as boron, indium and zinc, and provides an abundance ofholes to the channel. In one embodiment the first delta doped layer 158has a dopant concentration sufficient to provide 5×10¹¹/cm² to2×10¹²/cm² sheet carrier concentrations to the first quantum well layer121. In one embodiment, the first delta doped layer 158 has a thicknessof about three angstroms to about five angstroms.

In alternative embodiments, the first delta doped layer 158 can beformed in the first bottom barrier layer 119. A delta doped layer formedin the bottom barrier layer functions substantially the same as oneformed in the top barrier layer. In both instances, the delta dopedlayer provides free charge carriers to the quantum well layer. Inembodiments where no delta doped layer is formed in either the top orthe bottom barrier layers, the quantum well layer itself can be doped togenerate free charge carriers.

Referring back to FIG. 1B-1, the first barrier layer 123 hassubstantially the same composition as the first bottom barrier layer119. In one embodiment, the first barrier layer 123 has a thickness ofabout 100-500 angstroms. The etch stop layer 161 is provided to preventover-etching in future processing stages. The etch stop layer 161possesses drastically different etching characteristics than those ofmaterials that will later be deposited and etched. This provides a highdegree of protection from over-etching. In one embodiment, the etch stoplayer 161 comprises AlSb. In one embodiment, the etch stop layer isapproximately 10-50 A.

The first cap layer 163 reduces contact resistance, which can improvedevice performance. In one embodiment, the first cap layer 163 comprisesa material that has a smaller bandgap than the first barrier layer 123,which causes strain in the first barrier layer 123, further reducingcontact resistance. In one embodiment, the first cap layer 163 comprisesp-type doped epitaxial silicon. In one embodiment, the first cap layer163 has a thickness of around 10-50 nm. In the illustrated embodiment ofFIG. 1B-1, the recessed gate structure is formed in the first cap layer163.

In the illustrated embodiment of FIG. 1B-2, the first top barrier layer122 comprises a first spacer layer 156, a first delta doped layer 158,and a first barrier layer 123. In this embodiment, the recessed gatestructure is formed in the first barrier layer 123 and comprises ashallow recessed gate, in which there is a comparatively large distancebetween the first quantum well layer 121 and the first high-k gatedielectric layer 130.

In the illustrated embodiment of FIG. 1B-3, the first top barrier layer122 comprises a first spacer layer 156, a first delta doped layer 158,and a first barrier layer 123. In this embodiment, the recessed gatestructure is formed in the first barrier layer 123 and comprises a deeprecessed gate, in which there is a comparatively small distance betweenthe first quantum well layer 121 and the first high-k gate dielectriclayer 130.1

In the illustrated embodiment of FIG. 1B-4, the second top barrier layer129 comprises a second spacer layer 165, a second delta doped layer 168,a second barrier layer 128, a second etch stop layer 170, and a secondcap layer 172. In one embodiment, the second spacer layer 165 has acomposition that is substantially similar to the composition of thesecond bottom barrier layer 125. In one embodiment, the second spacerlayer 165 has a thickness of approximately 20-100 angstroms.

Since the second delta doped layer 168 is formed in the NMOS transistor107, it is an N-type delta doped layer and comprises an N-type dopantsuch as silicon, tellurium, phosphorus, arsenic, or antimony. The seconddelta doped layer 168 provides an abundance of electrons to the channel,improving device performance. In one embodiment, the second delta dopedlayer has a thickness of approximately 3-5 angstroms and provides about5×10¹¹/cm² to about 2×10¹²/cm² sheet carrier donors to the secondquantum well layer 127.

In one embodiment, the second etch stop layer comprises AlSb, InP orother III-V materials, which can be selectively etched with respect tothe second barrier layer 128. In one embodiment, the second etch stoplayer 170 has a thickness of about 10-50 A.

The second cap layer 172 improves contact resistance for the NMOStransistor 107. In one embodiment, the second cap layer 172 comprisesInGaAs with a high concentration of In. In alternative embodiments, thesecond cap layer 172 comprises one or more highly doped low bandgapmaterial. In one embodiment, the second cap layer 172 comprises n-dopedInSb. In one embodiment, the second cap layer 172 has a thickness ofabout 10-50 nm.

In the illustrated embodiment of FIG. 1B-5, the second top barrier layer129 comprises a second spacer layer 165, a second delta doped layer 168,and a second barrier layer 128. In this embodiment, the recessed gatestructure is formed in the second barrier layer 128 and comprises ashallow recessed gate.

In the illustrated embodiment of FIG. 1B-6, the second top barrier layer129 comprises a second spacer layer 165, a second delta doped layer 168,and a second barrier layer 128. In this embodiment, the recessed gatestructure is formed in the second barrier layer 128 and comprises a deeprecessed gate.

FIGS. 2A through 2M illustrate cross sections of the CMOS device 100 invarious stages of manufacture according to one possible process flow. Inalternative embodiments other process flows may be used. In theillustrated process flow, not every step of manufacture is shown, so asnot to obfuscate the invention. For example, wherever a layer isselectively formed or deposited on the substrate, or selectively etchedfrom the substrate, a photolithography process can be performed toenable such selectivity. In a photolithography process, photoresist isapplied to the substrate and patterned such that portions of thesubstrate are exposed and other portions are covered. Patterningphotoresist commonly includes exposing portions of the photoresist tohigh intensity radiation in a photolithography device, and etching theexposed portions. In subsequent processes, areas covered by thephotoresist are protected, such as from etching.

FIG. 2A illustrates a cross sectional view 200 of a substrate 112 inwhich STI structures 113 have been formed. STI structures can be formedby selectively etching portions of the substrate 112, and filling theetched regions with a dielectric material such as silicon dioxide. Toselectively etch portions of the substrate 112, either a standardphotomask or a hard mask such as silicon nitride can be used to protectregions that will not be etched. In one embodiment, a pad oxide isformed before the hard mask to relieve stress between the underlyingsubstrate 112 and the hard mask.

FIG. 2B illustrates a cross sectional view 205 of the substrate of FIG.2A after formation of a photoresist 202. The photoresist 202 in theillustrated embodiment has been selectively etched to protect regions ofthe substrate 112 where NMOS transistors will later be formed. In analternative embodiment, a hard mask may be formed rather than a standardphotoresist mask. In one embodiment, a pad oxide is formed prior toformation of the hard mask to relieve stress between the substrate 112and the hard mask.

FIG. 2C illustrates a cross sectional view 210 of a CMOS device 100 inan intermediate stage of manufacture after application of a first bufferlayer 115 on the substrate 112. The first buffer layer 115 can bedeposited, for example, by chemical vapor deposition (CVD) or molecularbeam epitaxy (MBE). In the illustrated embodiment, the substrate 112 isa p-type doped Silicon wafer or highly resistive Si wafer and the firstbuffer layer 115 is a graded SiGe buffer layer.

FIG. 2D illustrates a cross section 215 of the CMOS device 100 after thefirst bottom barrier layer 119 has been formed over the first bufferlayer 115. FIG. 2E shows a cross section 220 of the CMOS device 100after the first quantum well layer 121 has been formed over the firstbottom barrier layer 119. The first bottom barrier layer 119 and firstquantum well layer 121 can be deposited, for example, by CVD or MBE. Inthe illustrated embodiment, the first bottom barrier layer 119 isrelaxed SiGe and the first quantum well layer 121 is strained Ge.

FIG. 2F shows a cross section 225 of the CMOS device 100 after a firstspacer layer 156 has been formed over the first quantum well layer 121.FIG. 2G shows a cross sectional view 130 of the CMOS device 100 after afirst delta doped layer 158 has been formed over the first spacer layer156. FIG. 2H illustrates a cross section 235 of the CMOS device 100after formation of a first top barrier layer 122.

In one embodiment, the first delta doped layer 158 can be formed in thesame processing stage as the first spacer layer 156 by introducing adopant into the processing chamber after the first spacer layer 156 hasachieved an appropriate thickness. After the first delta doped layer 158has achieved the desired thickness, no more dopant is introduced intothe processing chamber and/or the dopant is evacuated from the chamber.In one embodiment, the dopant is introduced for about 15-45 seconds.Thereafter, formation of the first top barrier layer 122 can alsocommence in the same processing stage. In the illustrated embodiment,the first top barrier layer 122 is relaxed SiGe. In alternativeembodiments, the first delta doped layer 158 can be formed during thedeposition of the first bottom barrier layer 119 in substantially thesame manner as set forth above.

In one embodiment, the first buffer layer 115, first bottom barrierlayer 119, first quantum well layer 121, first spacer layer 156, firsttop barrier layer 122, and first delta doped layer 158 are all formed ina single process. For example, in one embodiment a graded SiGe layer isfirst deposited by CVD or MBE. During deposition, initially only Si isintroduced into a CVD or MBE processing chamber. After a certainthickness of Si has been deposited, slowly the percentage of Ge in theprocessing chamber is increased from 0% to between 55% and 75%. Thepercentage of Si remains fixed until a first bottom barrier layer 119 ofbetween 100-500 angstroms (A) has been deposited. No more Si isintroduced into the processing chamber and/or the Si is evacuated fromthe chamber, and Ge is deposited to a thickness of between 50-300 A toform the first quantum well layer 121. Si is again added to the chamberto the same previously fixed percentage to begin forming the firstspacer layer 156. After approximately 20-100 A have been deposited, adopant is introduced to the chamber to form a first delta doped layer158 of 3-5 A. No more dopant is introduced into the processing chamberand/or the dopant is evacuated from the chamber, and the first topbarrier layer 122 is deposited to a thickness between 100-500 A.

In one embodiment, after the deposition of the first buffer layer 115,the amount of Si in the processing chamber is increased such that thefirst bottom barrier layer 119 has a higher concentration of Si than thefirst buffer layer 115 has where they come in contact. The first spacerlayer 156 and first top barrier layer 122 would then be formed with thesame composition as the first bottom barrier layer 119. In alternativeembodiments, one or more of the layers are deposited in separateprocessing steps.

Referring to FIG. 21, a cross section 240 of the CMOS device 100 isillustrated after the formation of a first cap layer 163. In oneembodiment, the first cap layer 163 comprises silicon that is grown ordeposited over the first top barrier layer 122 epitaxially.

FIG. 2J illustrates a cross section 245 of the CMOS device 100 of FIG.21 after additional processing steps. As illustrated, the photoresist202 was removed, and subsequently a new photoresist 247 was placed andetched such that it protects PMOS transistor regions. In one embodiment,a hard mask is used rather than a standard photomask. After placement ofthe new photoresist 247, an isolation layer 110 was deposited on theside wall of the PMOS transistor 105. The isolation layer 110 can beformed, for example, by CVD or MBE, and comprises a dielectric materialsuch as silicon dioxide. In an alternative embodiment, the isolationlayer 110 can be formed by anisotropically etching the region betweenthe PMOS transistor 105 and NMOS transistor 107 and filling the etchedregion with a dielectric material after both transistors have beenformed. In one embodiment, the isolation layer 110 has a thicknessbetween about 10-200 A.

FIG. 2K shows a cross section 250 after a nucleation layer 116 has beenformed on the substrate 112. In one embodiment, the nucleation layer isformed by MBE or CVD at a temperature no higher than about 650 degreesC. FIG. 2L shows a cross section 255 after a second buffer layer 117 hasbeen formed on the nucleation layer 116. The second buffer layer 117 canbe deposited, for example, by CVD,MBE or MOCVD. In the illustratedembodiment, the nucleation layer 116 is an AlSb layer and the secondbuffer layer 115 is a metamorphic InAlSb buffer layer.

FIG. 2M shows a cross section 160 of the CMOS device 100 after thesecond bottom barrier layer 125 has been formed over the second bufferlayer 117. FIG. 2N shows a cross section 265 of the CMOS device 100after the second quantum well layer 127 has been formed over the secondbottom barrier layer 125. The second bottom barrier layer 125 and secondquantum well layer 127 can be deposited, for example, by CVD or MBE. Inthe illustrated embodiment, the second bottom barrier layer 125 isrelaxed InAlSb and the second quantum well layer 127 is strained InSb.

FIG. 20 shows a cross section 270 of the CMOS device 100 after a secondspacer layer 165 has been formed over the second quantum well layer 127.FIG. 2P shows a cross section 275 of the CMOS device 100 after a seconddelta doped layer 168 was formed over the second spacer layer 165. Thesecond delta doped layer 168 can be formed in substantially the samemanner as the first delta doped layer 158. FIG. 2Q shows a cross section280 of the CMOS device 100 after a second top barrier layer 129 has beenformed. In the illustrated embodiment, the second spacer layer 165 andsecond top barrier layer 129 are relaxed InAlSb.

In additional exemplary embodiments, the second delta doped layer 168can be formed during the deposition of the second top barrier layer 129in substantially the same manner as set forth above.

In one embodiment, the nucleation layer 116, second buffer layer 117,second bottom barrier layer 125, second quantum well layer 127, secondspacer layer 165, second top barrier layer 129, and second delta dopedlayer 168 are all formed in a single process. For example, in oneembodiment a nucleation layer 116 of AlSb is first deposited by CVD,MBEor MOCVD. Subsequently, In is gradually added to the processing chamberto form a graded InAlSb layer until the buffer layer and nucleationlayer have a combined thickness between one and five microns, and thesecond buffer layer 117 has approximately 15-30% Al.

The amount of In in the chamber remains constant until an InAlSb barrierlayer 125 is formed with a thickness of between 100-500 angstroms.

No more Al is added to the processing chamber and/or the Al is removedfrom the chamber and InSb is deposited to a thickness of between 50-300A to form the second quantum well layer 127. Al is again added to thechamber to begin forming the second spacer layer 165 at the same setcomposition as the second bottom barrier layer 125. After approximately20-100 A have been deposited, a dopant is introduced to the chamber toform a second delta doped layer 168 having a thickness of 3-5 Å. Thedopant is evacuated from the chamber, and the second top barrier layer129 is deposited to a thickness between 100-500 A. In alternativeembodiments, one or more of the layers are deposited in separateprocessing steps.

FIG. 2R shows a cross section 285 of the CMOS device 100 after a secondcap layer 172 has been formed over the second top barrier layer 129. Inone embodiment, the second cap layer 172 is formed by CVD, MBE or MOCVDand comprises n-doped InSb.

In one embodiment, the second buffer layer 117, second bottom barrierlayer 125, second quantum well layer 127, second spacer layer 165,second delta doped layer 168, second top barrier layer 129 and secondcap layer 172 are all formed at processing temperatures below at least500 degrees C. In one embodiment, these processes are performed at orbelow around 420 degrees C.

FIG. 2S shows a cross section 290 of the CMOS device 100 after the newphotoresist 247 was removed. FIG. 2T shows a cross sectional view 295 ofthe CMOS device 295 after photoresist 298 has been selectively formedover the first and second cap layers 163 and 172, respectively. FIG. 2Uillustrates a cross sectional view 300 of the CMOS device 100 after thePMOS drain metal contact 140, PMOS source metal contact 142, NMOS drainmetal contact 141 and NMOS source metal contact 143 have been formed. Inone embodiment, the metal contacts all comprise the same metal and areformed concurrently. In an alternative embodiment, the PMOS contacts 140and 142, are formed of a silicon contact metal and the NMOS contacts 141and 143, are formed of a III-V contact metal. In this embodiment, theNMOS contacts and PMOS contacts are formed in separate processes, and anadditional masking and etching step are required. In one embodiment, thecontacts are annealed after formation. In one embodiment, the contactsare annealed using a low temperature anneal no higher then about 420degrees C.

FIG. 2V illustrates a cross sectional view 295 of the CMOS device 305after formation of a photoresist 308 over the metal contacts. FIG. 2Wshows a cross section 310 of the CMOS device 100 after a gate region hasbeen etched into the first top barrier 122 and second top barrier layer129. The etched regions frame recessed gate areas where recessed gateswill be formed. In one embodiment, the etch is performed isotropically.In one embodiment, the etch is performed such that the distance from thesurface of the top barrier layers, 122 and 129, to the QW layers, 121and 127, is about 5-50 nm. In an alternative embodiment, no cap layersare deposited. In this embodiment, the top barrier layers 122 and 129are etched to frame recessed gate regions. In alternative embodiments,the processes shown and described with regards to FIGS. 2V and 2W may beomitted. When these processes are omitted, recessed gates will not beformed.

FIG. 2X shows a cross section 315 of the CMOS device 100 after thephotoresist 308 has been removed and an additional photoresist 317 hasbeen selectively placed to reveal areas where the gate electrodes willbe deposited. FIG. 2Y illustrates a cross section 320 of the CMOS device100 after a first high-k gate dielectric layer 130 is formed above thefirst top barrier layer 122 and a second high-k gate dielectric layer135 is formed above the second top barrier layer 129. In the embodimentshown, the first high-k gate dielectric layer 130 and second high-k gatedielectric layer 135 are formed simultaneously in a single process, suchas by CVD or atomic layer deposition (ALD). In an alternativeembodiment, the first high-k gate dielectric layer 130 and second high-kgate dielectric layer 135 are formed in separate processes and arecomposed of different materials from one another. For example, the firsthigh-K gate dielectric can comprise HfO₂ and the second high-K gatedielectric can comprise Al₂O₃. Where different high-K gate dielectricsare used an additional photolithography masking and etching step may berequired.

FIG. 2Z illustrates a cross section 325 of the CMOS device 100 after afirst metal gate electrode 133 is formed over the first high-k gatedielectric layer 130, and a second metal gate electrode 137 is formedover the second high-k gate dielectric layer 135, and the additionalphotoresist 317 is removed. The first high-k gate dielectric layer 130and the first metal gate electrode 133 form a first recessed gatestructure 148, and the second high-k gate dielectric layer 135 and thesecond metal gate electrode 137 form a second recessed gate structure149. In the illustrated embodiment, the first metal gate electrode 133and second metal gate electrode 137 can be substantially the samematerial and are formed simultaneously, such as, for example, bysputtering or physical vapor deposition (PVD) or an e-beam evaporator.In one embodiment, the first metal gate electrode 133 and second metalgate electrode 137 are metal gate electrodes comprising TiN or othermid-gap metals. In alternative embodiments, the first metal gateelectrode 133 and second metal gate electrode 137 may comprise differentmaterials and be formed in separate processes. For example, the firstmetal gate electrode 133 can be a metal gate electrode comprised of aP-type metal such as Al, and the second metal gate electrode 137 can bea metal gate electrode comprised of an N-type metal such as Ti.

Manufacture of the CMOS device is not limited to the sequence ofoperations illustrated in FIGS. 2A through 2Z. For example, the high-kgate dielectric layers 130 and 135, and the metal gate electrodes 133and 137, can be formed before the isolation layer 110 and/or the sourceand drain metal contacts 140 and 142. Additionally, in alternativeembodiments, the cap layers, delta doped layers, and spacer layers maybe omitted. In some embodiments, etch stop layers may be depositedsubsequent to deposition of the top barrier layers.

The foregoing embodiments of the invention have been presented for thepurpose of illustration. Although the invention has been described bycertain preceding examples, it is not to be construed as being limitedby them. They are not intended to be exhaustive, or to limit the scopeof the invention. Modifications, improvements and variations within thescope of the invention are possible in light of this disclosure.

What is claimed is:
 1. A transistor, comprising: a doped siliconsemi-insulating substrate; a buffer layer disposed above the dopedsilicon semi-insulating substrate; a bottom barrier layer disposed abovethe buffer layer wherein the bottom barrier layer comprises a materialdifferent than the buffer layer; a group III-V material quantum welllayer disposed above the bottom barrier layer; a top barrier layerdisposed above the group III-V material quantum well layer; a gate stackdisposed above the top barrier layer, the gate stack comprising: ahigh-k gate dielectric layer disposed above the top barrier layer; and ametal gate electrode disposed above the high-k gate dielectric layer;and raised source and drain regions disposed above an etch stop layerdisposed above the top barrier layer, the raised source and drainregions disposed on either side of the gate stack.
 2. The transistor ofclaim 1, wherein the group III-V material quantum well layer is anindium arsenide (InAs) quantum well layer.
 3. The transistor of claim 1,wherein the high-k gate dielectric layer is an aluminum oxide (Al₂O₃)high-k gate dielectric layer.
 4. The transistor of claim 3, wherein thealuminum oxide (Al₂O₃) high-k gate dielectric layer has a thicknessapproximately in the range of 1.5-7.5 nanometers.
 5. The transistor ofclaim 1, wherein the metal gate electrode has a gate lengthapproximately in the range of 20-250 nanometers.
 6. The transistor ofclaim 1, wherein the etch stop layer has a thickness approximately inthe range of 1-5 nanometers.
 7. The transistor of claim 1, wherein thegroup III-V material quantum well layer has a thickness approximately inthe range of 5-30 nanometers.
 8. The transistor of claim 1, wherein thebuffer layer comprises indium (In) and aluminum (Al).
 9. The transistorof claim 1, wherein the metal gate electrode comprises a mid-gap metal.10. A method of fabricating a transistor, the method comprising: forminga doped silicon semi-insulating substrate; forming a buffer layer abovethe doped silicon semi-insulating substrate; forming a bottom barrierlayer above the buffer layer wherein the bottom barrier layer comprisesa material different than the buffer layer; forming a group III-Vmaterial quantum well layer above the bottom barrier layer; forming atop barrier layer above the group III-V material quantum well layer;forming raised source and drain regions disposed above an etch stoplayer formed above the top barrier layer; subsequent to forming theraised source and drain regions, forming a gate stack above the topbarrier layer, forming the gate stack comprising: forming a high-k gatedielectric layer above the top barrier layer; and forming a metal gateelectrode above the high-k gate dielectric layer, wherein the raisedsource and drain regions are on either side of the gate stack.
 11. Themethod of claim 10, wherein forming the group III-V material quantumwell layer comprises forming an indium arsenide (InAs) quantum welllayer.
 12. The method of claim 10, wherein forming the high-k gatedielectric layer comprises forming an aluminum oxide (Al₂O₃) high-k gatedielectric layer.
 13. The method of claim 12, wherein the aluminum oxide(Al₂O₃) high-k gate dielectric layer is formed to a thicknessapproximately in the range of 1.5-7.5 nanometers.
 14. The method ofclaim 10, wherein the metal gate electrode is formed to a gate lengthapproximately in the range of 20-250 nanometers.
 15. The method of claim10, wherein the etch stop layer is formed to a thickness approximatelyin the range of 1-5 nanometers.
 16. The method of claim 10, wherein thegroup III-V material quantum well layer is formed to a thicknessapproximately in the range of 5-30 nanometers.
 17. The method of claim10, wherein forming the buffer layer comprises forming a layercomprising indium (In) and aluminum (Al).
 18. The method of claim 10,wherein forming the metal gate electrode comprises forming a mid-gapmetal layer.